Please use this identifier to cite or link to this item: https://dspace.upt.ro/xmlui/handle/123456789/1069
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dc.contributor.authorAvram, Adrian-
dc.contributor.authorRusanovschi, Vitalie-
dc.date.accessioned2020-03-26T06:11:53Z-
dc.date.accessioned2021-03-01T08:44:39Z-
dc.date.available2020-03-26T06:11:53Z-
dc.date.available2021-03-01T08:44:39Z-
dc.date.issued2011-
dc.identifier.citationAvram, Adrian. Physical basis of prediction MOS function prediction method under ionizing condition. Timişoara: Editura Politehnica, 2011en_US
dc.identifier.urihttp://primo.upt.ro:1701/primo-explore/fulldisplay?docid=40TUT000128666&context=L&vid=40TUT_V1&lang=ro_RO&search_scope=40TUT&adaptor=Local%20Search%20Engine&tab=default_tab&query=any,contains,Physical%20basis%20of%20prediction%20MOS%20function%20prediction%20method%20under%20ionizing%20condition&sortby=rank&offset=0 Link Primo-
dc.description.abstractEffects occurring in the active elements of integrated circuits (IC) depend on dose accumulation summary, the absorption unit defects under the action of high energy particles. Presented method refers only to predict degradation parameters due to accumulated dose of integrated circuits summary absorption. MOS structures response prediction under ionizing action will be reduced to determination of oxide charge value and surface state charge value.en_US
dc.language.isoenen_US
dc.publisherTimișoara: Editura Politehnicaen_US
dc.relation.ispartofseriesSeria electronică şi telecomunicaţii;Tom 56(70), fasc. 1 (2011)-
dc.titlePhysical basis of prediction MOS function prediction method under ionizing condition [articol]en_US
dc.typeArticleen_US
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